MAR-P30 2-Diazo-1-Naphthol-5-Sulfonic Acid Sodium Salt
MAR-P31 2-Diazo-1-Naphthol-4-Sulfonic Acid Sodium Salt
MAR-P32 Obtained by the Partial Ester Esterification Between the1,2-Naphthoquinone  Diazide-5-Sulfonyl Chloride and
P-Cresol Resin
MAR-P33 Obtained by the Partial Esterification Between the 1,2-Naphthoquinone Diazide-4-Sulfonyl Chloride and
P-Cresol Resin
  MAR-P33A Obtained by the Partial Esterification Between the 1,2-Naphthoquinone Diazide-5-Sulfonyl Chloride and
P-Cresol Resin
MAR-P34 1,2-Naphthoquinone Diazide –4-Sulfonyl Chloride and a P-Cumyl Phenol
MAR-P35 1,2-Naphthoquinone Diazide –5-Sulfonyl Chloride and  P-Cumyl Phenol
MAR-P36 Obtained by the Partial Esterification Between the 1,2-Naphthoquinone Diazide-5-Sulfonyl Chloride and Pylogalol Aceton Resin
MAR-P37 Obtained by the Condensation Between the M-P-Cresole and Formaldehyde
MAR-P38 Obtained by the Condensation Between the T-Butyl Phenol and Formaldehyde
MAR-P39 Obtained by the Condensation Between the p-Cresol and  Formaldehyde
MAR-P40 2,3,4-Trihydoroxy Benzopheneone
MAR-P41 2,3,4,4’-Tetrahydoroxy  Benzophenone
MAR-P42 Pylogalol Aceton Resin
MAR-P43 Easter of 1,2-Naphthpquinone-2-Diazide-5-Sulfonic Acid with 2,3,4-Trihydroxy Benzophenone
MAR-P44 Ester of 1,2-Naphthoquinone –2-Diazide-5-Sulufonic Acid with 2,3,4,4’-Tetrahydroxy Benzophenone
   
Others At your request;: Photosensitive Compound for I.C & P.S Plate